雜志介紹

Plasma Chemistry And Plasma Processing雜志介紹

《Plasma Chemistry And Plasma Processing》是一本(ben)(ben)(ben)以English為(wei)主(zhu)的未開放獲取(qu)國際優秀期刊(kan)，中文名稱等離(li)(li)子化學和(he)等離(li)(li)子處(chu)理(li)，本(ben)(ben)(ben)刊(kan)主(zhu)要出版、報道物理(li)與天體(ti)物理(li)-ENGINEERING, CHEMICAL領域(yu)的研(yan)(yan)究動(dong)態以及(ji)在(zai)該(gai)領域(yu)取(qu)得的各(ge)方面的經驗和(he)科研(yan)(yan)成果，介紹該(gai)領域(yu)有(you)關本(ben)(ben)(ben)專業的最新(xin)(xin)進展(zhan)(zhan)，探討行業發展(zhan)(zhan)的思路和(he)方法(fa)，以促(cu)進學術信息交流，提(ti)高行業發展(zhan)(zhan)。該(gai)刊(kan)已被國際權威(wei)數(shu)據庫(ku)SCIE收(shou)錄，為(wei)該(gai)領域(yu)相(xiang)關學科的發展(zhan)(zhan)起(qi)到了(le)良好(hao)的推動(dong)作用，也得到了(le)本(ben)(ben)(ben)專業人員的廣泛認可。該(gai)刊(kan)最新(xin)(xin)影響(xiang)因子為(wei)2.6，最新(xin)(xin)CiteScore 指數(shu)為(wei)5.9。

本刊近期中國學者發表的論文主要有：

• Plasma-Catalytic Ammonia Decomposition for Carbon-Free Hydrogen Production Using Low Pressure-Synthesized Mo2N Catalyst

  Author: Yu, Xiuxia; Hu, Ke; Zhang, Huazhou; He, Ge; Xia, Yuanhua; Deng, Mao; Shi, Yang; Yang, Chi; Mao, Xinchun; Wang, Zhijun

• Electron Density and Electron Temperature Control with a Magnetic Field and a Grid in Inductively Coupled Argon Plasma

  Author: He, Yun-peng; Jin, Wei; Wang, Yi-bo; Lv, Shao-bo; Wang, Rui-sheng; Liu, Jun-qi; Liu, Hai-cheng

• Study on the Anticancer Effects of Plasma-Activated Saline Perfusion Based on a Microfluidic System

  Author: Zhang, Jishen; Xu, Shengduo; Jing, Xixi; Liu, Dingxin; Zhang, Hao; Wang, Zifeng; Xu, Dehui; Zhang, Geng; Yang, Xiaojian; Wang, Xiaohua; Kong, Michael G.; Rong, Mingzhe

• A RF plasma source with focused magnetic field for material treatment

  Author: Zhang, L. P.; Chang, L.; Yuan, X. G.; Zhang, J. H.; Zhou, H. S.; Luo, G. N.

英文介紹

Plasma Chemistry And Plasma Processing雜志英文介紹

Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.